Researchers fabricate a high-performance lead-free perovskite RRAM device, using low-temperature sputtering
Researchers from Taiwan's National Cheng Kung University developed RRAM memory based on lead-free Na0.5K0.5NbO3/HfO perovskite materials. The researchers fabricated a device using low-temperature sputtering, and report high performance and excellent process compatibility.
The researchers say that the new device exhibits forming-free switching, low operating voltages (−1 V/1.5 V), a high ON/OFF ratio of ∼200, and endurance exceeding 105 cycles.




