Strategic Elements achieved significant technical improvements in its Memroy Ink fabrication technology

Strategic Elements announced that it has achieved significant technical improvements in its Nanocube Memory Ink technology at the University of New South wales (UNSW). The company is now incorporating these advancements into a transparent demonstrator that will be ready by Q3 2019.

Strategic Elements memory ink photo

SER says that it has developed new fabrication methods for its memory ink and its production onto plastics. SER has filed patents for these methods.

Microsemi licenses Crossbar's RRAM IP, to integrate it in its future aerospace and military products

Crossbar logoCrossbar announced that Microsemi, the largest US military and aerospace semiconductor supplier, has signed a licensing agreement which will bring Crossbar's RRAM technology to Microsemi's products.

As part of the agreement, Microsemi and Crossbar will collaborate in the research, development and application of Crossbar’s proprietary ReRAM technology in next generation products from Microsemi.

Western Digital licenses ReRAM technology from Rambus

Rambus logoRambus announced that it signed a broad patent license agreement with western digital. The agreement covers the use of several memory technologies - including memory architectures, high speed interfaces, security technologies and ReRAM.

Rambus did not provide any more details, but the agreement will last until 2021 with an option for an additional 5-year extension.

Intermolecular offers its ReRAM technology for licensing

Advanced material innovator Intermolecular announced that it is now offering its ReRAM technology for licensing.

Intermolecular's ReRAM IP includes a unit cell comprising of multilayers of transition metal oxides and variants between electrodes. The cell can be optimized for application-specific devices, performance and reliability. Intermolecular says that its ReRAM features low power operation and improved data retention. The cell uses a small footprint (6-10F2) and is based on manufacturing-friendly materials.