Leti confirms the Reproducibility of Weebit Nano's RRAM tech, details plans for a 40nm cell
A couple of months ago, we reported that Israel-based RRAM developer Weebit Nano partnered with France-based research institute Leti, to co-develop advanced RRAM devices based on silicon oxide.
Weebit Nano now announced that its SiOx ReRAM memory technology has been successfully transferred from Rice University’s facilities to Leti’s pre-industrialisation facility in Grenoble, France. Leti's initial experiments confirm that Weebit’s unique nano-porous SiOx process is reproducible.
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Posted: Nov 09,2016